On-Chip Training and Inference with Conductive-Metal-Oxide/HfOx ReRAM Devices” was published by researchers at IBM ...

A new technical paper titled “Towards Mixed-Criticality Software Architectures for Centralized HPC Platforms in ...

A new technical paper titled “Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined ...

A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by ...

A new technical paper titled “Performance, efficiency, and cost analysis of wafer-scale AI accelerators vs. single-chip GPUs” ...

Just because the various components in an advanced package work individually and separately doesn't mean they will work ...

HBM compatibility vs. customizability; 3D-IC marks shift for EDA; AI ToF decoding; AI-defined vehicles; genAI in EDA.

Evolving lithography demands are challenging mask writing technology, and the shift to curvilinear is happening.

Moving data is one of the big challenges in the AI world. There is so much data being generated that even moving it back and ...

This is hard enough in hyperscale data centers, which are sprouting up everywhere to handle the training and some inferencing ...

A new technical paper titled “HBM Roadmap Ver 1.7 Workshop” was published by researchers at KAIST’s TERALAB. The 371-page ...

A new technical paper titled “Impact of Parameter Uncertainties on Power Electronic Device Lifetime Predictions” was ...